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GRO~RD-WATER MONITORING AT MSWLF FACILITIES <br /> <br />RULE .1633 DETECTION MONITORING <br /> <br />(s) Appendix I Constituents <br /> <br />(b) S~im~-ual Sampling <br /> <br />J,,~e 24, 1994 M~mo <br /> <br />- Laboratory certifiedbyDEM for ~round-water analysis for <br /> the specific certification levels <br /> <br /> Most metals require a 'low level' certified method <br /> <br /> Required reporting levels - PQLs <br /> Practical Quantitation limits <br /> <br />January 18, 1995 Memo <br /> <br />Clarification of June m-~o <br /> <br />Regular ICP (Inductively Coupled Plasma) NOT APPROVED for <br />metals requiring "low levelm certification <br /> <br />Graphite Furnace methods generally needed for metals <br />~equiring mlow level' certification <br /> <br />ICP/MS or Trace ICP equipment may be used for metals <br />requiring ~low level' certification if the laboratory and <br />equipment have been certified for 'low level' metals <br />analyses by DEM <br /> <br />(c) Statistically Si~nificm~t Increase <br /> <br /> <br />